Atomic Layer Deposition

TFS 200 is the most flexible ALD research platform ever designed for academic research and corporate R&D. Beneq TFS 200 has specifically been designed to minimise any cross contamination that could happen in a multi-user research environment. The large number of available options and upgrades means that your Beneq TFS 200 will grow with you to meet even the most demanding research requirements.

The SC-1 is a ground-breaking and high-performing cluster equipment that combines Atomic Layer Deposition (ALD) with Physical Vapor Deposition (PVD) in an extremely compact, modular, and fully automated system for high-throughput production of multinanolayered coatings from the ALD and PVD materials library.

The TFS 500 is ideal for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its case as a versatile tool for both in-depth ALD research and robust batch processing. The TFS 500 is an ideal tool for multi-project environments.

The SC Qube is an ALD batch system for R & D and small scale production to coat different kinds and sizes of 3D parts. The patent-pending scalable chamber from Swiss Cluster can be configured to fit to all types of 3D parts and coating material requirements to deliver exceptional coating homogeneity at unparalleled process speeds.

The SC Optima Series is the next generation of large batch systems for Atomic Layer Deposition (ALD). The SC Optima has been carefully optimised to deliver high-quality and uniform coatings to all types of 3D objects in record time, streamlining every step of your door-to door processes, from loading to unloading.