Founded as a spin-off company of the Karlsruhe Institute of Technology in 2007, today the name Nanoscribe stands for nano- and microfabrication in three dimensions. As market and technology leader, the German company supports science and industry all over the world with high-tech solutions in 3D laser lithography. The product portfolio covers both laser lithography systems for 3D micro- and nanostructures based on two photon polymerization as well as specifically designed IP-photoresists. In order to provide a complete solution, Nanoscribe additionally offers know-how in casting of 3D structures, e.g., into metals or semi-conductors. The applications are widely spread e.g. photonics, photonic waveguides and wire bonds, micro-optics, micro-fluidics, biomimetics or scaffolds for cell biology.
The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system, allowing for true three-dimensional nanostructures in commercially available photoresists. Designed for the high demands of three-dimensional photonic crystal structures, the instrument is suitable for generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry and more.
Nanoscribe's family of IP-photoresists is specifically designed for the demands of 3D Direct Laser Writing by two-photon absorption: Extraordinary resolution in three dimensions with highest mechanical stability. As a response to the vast variety of applications, Nanoscribe provides liquid and sol-gel negative-tone photoresists with outstanding features: IP-L (780), IP-G (780) and IP-Dip.
The combination of these properties not only enables you to push resolution to its limits but also to work reproducibly with little efforts in optimising process parameters. Depending on the choice of microscope objective and substrate used, the writing process can be observed in-situ and real-time. The visual feedback enables fast cycles of parameter optimisation for new 3D fabrication designs.[ Send Enquiry ]