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Founded as a spin-off company of the Karlsruhe Institute of Technology in 2007, today the name Nanoscribe stands for nano- and microfabrication in three dimensions. As market and technology leader, the German company supports science and industry all over the world with high-tech solutions in 3D laser lithography. The product portfolio covers both laser lithography systems for 3D micro- and nanostructures based on two photon polymerization as well as specifically designed IP-photoresists. In order to provide a complete solution, Nanoscribe additionally offers know-how in casting of 3D structures, e.g., into metals or semi-conductors. The applications are widely spread e.g. photonics, photonic waveguides and wire bonds, micro-optics, micro-fluidics, biomimetics or scaffolds for cell biology.
3D Laser Lithography
Technology From: Nanoscribe
Photonic Professional
The Nanoscribe Photonic Professional is an easy-to-operate table-top laser lithography system, allowing for true three-dimensional nanostructures in commercially available photoresists. Designed for the high demands of three-dimensional photonic crystal structures, the instrument is suitable for generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry and more.
Key Features
- True 3D writing capability with highest precision based on piezo nanopositioning.
- Autofocus: Due to patented technology, the interface between substrate and photoresist is determined exactly and autonomously. This establishes the basis for reliable anchoring structures to the substrate, whether 2D or 3D.
- Software: Provides easy access to all adjustable features of the lithography system. Complex 3D structures written in CAD software, e.g. STL files, can be easily and straightforward converted for the directly import to the controlling interface.
- PerfectShape: High accuracy can be achieved by automatically adapting sample movement speed and laser power during the writing process.
- Easy Sample Exchange: The system is provided with a quick-change, slide-in substrate holder. A second set of substrates may be prepared and mounted to a spare holder while the system is in operation. The substrate holders can be exchanged without any tools within less than one minute.
- Capability for aberration constant writing with highest resolution for structures up to the mm-range by means of the Dip-In Laser Lithography (DiLL) technique.
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Technology From: Nanoscribe
IP Photoresists
Nanoscribe's family of IP-photoresists is specifically designed for the demands of 3D Direct Laser Writing by two-photon absorption: Extraordinary resolution in three dimensions with highest mechanical stability. As a response to the vast variety of applications, Nanoscribe provides liquid and sol-gel negative-tone photoresists with outstanding features: IP-L (780), IP-G (780) and IP-Dip.
Key Features
- Feature sizes down to 150nm
- Low proximity effect
- Low stress
- Little shrinkage
- Good adhesion even on glass substrates
- Easy handling
The combination of these properties not only enables you to push resolution to its limits but also to work reproducibly with little efforts in optimising process parameters. Depending on the choice of microscope objective and substrate used, the writing process can be observed in-situ and real-time. The visual feedback enables fast cycles of parameter optimisation for new 3D fabrication designs.
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